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The International Journal of Oral & Maxillofacial Implants



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Int J Oral Maxillofac Implants 5 (1990), No. 3     1. Sep. 1990
Int J Oral Maxillofac Implants 5 (1990), No. 3  (01.09.1990)

Page 264-271

Oxide Thickness and Surface Contamination of Six Endosseous Dental Implants Determined by Electron Spectroscopy for Chemical Analysis: A Preliminary Report
Klauber, Craig / Lenz, Lawrence J. / Henry, Patrick J.
Electron spectroscopy and argon ion etching were used to determine the depth and composition of the oxide layers of six competitive dental implant systems. To minimize problems associated with analyzing the active oxide layers, the implants were removed from their original packaging in an oxygen-free environment. The majority of the six implant systems were found to have similar oxide thicknesses in the range of 20 to 34 Å. Some variation was found in the extent of non-oxide surface contamination.

Keywords: dental implants, electron spectroscopy, oxide layer, titanium